Since the invention of the Atomic Force Microscope (AFM) in 1986, numerous analytical techniques have been developed and implemented on the AFM platform, evolving into what is collectively called the Scanning Probe Microscope (SPM).  The SPM has since become established as a mainstream analytical instrument with a continually increasing role in the development of nanoscale semiconductor technologies providing critical data from initial concept to technology development to manufacturing to failure analysis.  This presentation will discuss Atomic Force Microscopy (AFM), Scanning Kelvin Probe Microscopy (SKPM), Scanning Capacitance Microscopy (SCM), Conductive-AFM (C-AFM), Magnetic Force Microscopy (MFM), and Scanning Surface Photo Voltage Microscopy (SSPVM).  An overview of each technique will be presented along with examples of how each is currently used in the development of new technologies, the monitoring of a manufacturing line, and the failure analysis of nanoscale semiconductor devices. There will also be a discussion on conducting competitive technology analysis.

Refreshments will be provided.